Ti+Al, Al+Sc, Ag, Indium+Tin, Ni+Cr | Alloy Sputtering Target Supplier

Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings.

Ti+Al (Titanium Aluminum) Alloy Sputtering Target:

Material Composition: Titanium (Ti) and Aluminum (Al) alloy

Description: Ti+Al alloy sputtering targets are used for the deposition of thin films with specific properties such as corrosion resistance, high temperature resistance, and mechanical strength. These alloys find applications in aerospace, automotive, and biomedical industries.

Al+Sc (Aluminum Scandium) Alloy Sputtering Target:

Material Composition: Aluminum (Al) and Scandium (Sc) alloy

Description: Al+Sc alloy sputtering targets are utilized for the deposition of thin films with enhanced mechanical properties, such as high strength, lightweight, and improved corrosion resistance. These alloys are commonly used in aerospace, sporting goods, and automotive components.

Ag (Silver) Alloy Sputtering Target:

Material Composition: Silver (Ag) alloy

Description: Ag sputtering targets are employed for the deposition of silver thin films in various applications, including optical coatings, electrical contacts, and decorative finishes. Silver films exhibit excellent electrical conductivity and optical reflectivity, making them suitable for electronic and optical devices.

Indium+Tin (In+Sn) Alloy Sputtering Target:

Material Composition: Indium (In) and Tin (Sn) alloy

Description: In+Sn alloy sputtering targets are used for the deposition of indium-tin oxide (ITO) thin films, which are transparent conductive coatings widely used in applications such as touchscreens, flat-panel displays, and solar cells. These coatings exhibit both electrical conductivity and optical transparency.

Ni+Cr (Nickel Chromium) Alloy Sputtering Target:

Material Composition: Nickel (Ni) and Chromium (Cr) alloy

Description: Ni+Cr alloy sputtering targets are utilized for the deposition of thin films with properties such as high temperature resistance, corrosion resistance, and oxidation resistance. These alloys find applications in various industries, including aerospace, automotive, and electronics.