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  • High Refractive Index Material
  • High Refractive Index Material
  • High Refractive Index Material

High Refractive Index Material

ACETRON offers a wide selection of evaporation materials for all PVD processes. Our product range comprises dozens of evaporation materials including special mixtures, fluorides, oxides, sulfides and metals. They are available in various forms including granules, tablets and purities in quantities ranging from several grams to hundreds of kilograms. Our extensive manufacturing capabilities allow us to custom prepare nearly and material to your exact specification.

All evaporation materials are designed and manufactured to improve the quality and performance of your evaporation processes. Reproducibility of every single batch ensures that desired product characteristics can be repeatedly achieved in our customer’s evaporation processes.


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  • ACETRON High Refractive Index Material

MaterialCAS #
 DensityPurityMelting PointType of EvaporationEvaporation Source(Typical)
●=very good, ○= possible		Specific Evaporation ConditionsFilm Transparency Range Typically UsedFilm Refractive Index @ 550nmTransparent RangeRemarks
Origin of Value Uncertain
MeltingSublimationE-Gun
Crucible / Liner material		E-Gun
Boat material		PremeltingLow Residual PressureReactive GasSubstrate Temperature RangeIron or Plasma
Assistance		Low
μm		High
μm
Cu CrucibleW CrucibleMo CrucibleTa CrucibleC CrucibleAl2O3BN CrucibleW BoatMo BoatTa Boat<100℃100-200℃200-300℃
Cr2O31308-38-95.20 g/cm³3N2350 ℃
√

●



○

√√




0.682.50 600-8000nmH-Index material for adhesion promotion, structurable and filter coatings
HfO212055-23-19.68 g/cm³3N52811 ℃√√

●



○

√


√√
0.2381.99 200-9000nmH-Index material for laser coating applications
ITO
(In2O3+SnO2)		1312-43-2
18282-10-5		4.30 g/cm³4N1650 ℃
√●
●



○●

√

√√possible
~0.4~1.11.90~2.00
depend on composition and deposition condition		400-1100nmTransparent Conductive Films
ITO
(In2O3+SnO2)		1312-43-2
18282-10-5		≥7.08 g/cm³4N1910 ℃
√●
●



○●

√

√√possible
~0.4~1.11.90~2.00
depend on composition and deposition condition		400-1100nmTransparent Conductive Films
La2O31312-81-86.51 g/cm³3N2217 ℃√√






○
○
√√



0.3521.88 300-20000nmM-Index Material for Anti-reflective film and multilayered films
La2O3+TiO21312-81-8
13463-67-7		4.80 g/cm³3N1800 ℃




















2.07 360-7000nmN/A
Nb2O51313-96-84.47 g/cm³4N1460 ℃√


●



○

√
√
√√√0.38~0.4282.34 350-9000nmH-Index material for VIS-NIR spctral range, especially for heat protection coatings
Si3N412033-89-52.70 g/cm³3N1900 ℃
√


















2.03 N/AFor Anti-Reflective film, Insulating film and protecting film
Ta2O51314-61-07.80 g/cm³4N1800 ℃√
●●




○

√
√
√√√0.35102.15 350-9000nmH-Index Material for NUV-VIS-NIR multilayer coatings, especially telecommunications filter and structurable coatings
Ta2O5+TiO21314-61-0
13463-67-7		7.14 g/cm³3N51700 ℃














√
√


2.04~2.19
(substrate to be heated to 250℃)

1.86~2.08
(substrate is about 25℃)		360-9000nmN/A
TiC12070-08-54.90 g/cm³3N3140 ℃
√


















N/AN/AN/A
TiO12137-20-14.90 g/cm³3N1750 ℃√


●



●

√
√√√√√0.4>82.18 400-12000nmFilm composition: TiO2 (H-Index oxide material with highest index for VIS-NIR applications)
TiO213463-67-74.20 g/cm³3N1780 ℃√


●



○

√
√√√√√0.4>82.18 400-12000nmH-Index oxide material with highest index for VIS-NIR applications
TiO2+Nb2O51313-96-8
13463-67-7		4.20 g/cm³3N1775 ℃




















2.35 400-12000nmH-Index Material for filter&cold light coating&anti-reflective coating
Ti2O31344-54-34.60 g/cm³3N2130 ℃√


●



●

√
√√√√√0.4>82.35 400-12000nmFilm composition: TiO2 (H-Index oxide material with highest index for VIS-NIR applications)
Ti3O512065-65-54.50 g/cm³3N1800 ℃√


●



○

√
√√√√√0.4>82.32 400-12000nmFilm composition: TiO2 (H-Index oxide material with highest index for VIS-NIR applications)
WO31314-35-87.20 g/cm³4N1473 ℃
√






●



√√√

~0.38102~2.28380-10000nmN/A
ZnS1314-98-34.10 g/cm³3N1850 ℃
√

●



●●●


√possible


0.4142.35 400-15000nmH-Index or M-Index material for IR applications or H-Index material for holographic coating applications
ZnSe1315-09-95.40 g/cm³4N1100 ℃
√






●●●


√possible


0.6152.44 @ 1300nm650-18000nmH-Index or M-Index material for IR applications
ZrO21314-23-45.89 g/cm³3N52700 ℃possiblepossible

●



○

√
√√√√√0.3472.01 250-9000nmH-Index Material for NUV-VIS-NIR applications
ZrO2+Ta2O51314-23-4
1314-61-0		≥4.8 g/cm³3N52100 ℃√
●
●






√
√√√√√0.471.98 400-9000nmN/A
ZrO2+TiO21314-23-4
1317-80-2		4.80 g/cm³3N2100 ℃√
●
●






√
√√√√√0.472.08 360-7000nmN/A

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