STOCK CODE: 300706

EN
  • Medium Refractive Index Material
  • Medium Refractive Index Material
  • Medium Refractive Index Material

Medium Refractive Index Material

ACETRON offers a wide selection of evaporation materials for all PVD processes. Our product range comprises dozens of evaporation materials including special mixtures, fluorides, oxides, sulfides and metals. They are available in various forms including granules, tablets and purities in quantities ranging from several grams to hundreds of kilograms. Our extensive manufacturing capabilities allow us to custom prepare nearly and material to your exact specification.

All evaporation materials are designed and manufactured to improve the quality and performance of your evaporation processes. Reproducibility of every single batch ensures that desired product characteristics can be repeatedly achieved in our customer’s evaporation processes.


Inquire Now
MaterialCAS #
 DensityPurityMelting PointType of EvaporationEvaporation Source(Typical)
●=very good, ○= possible
Specific Evaporation ConditionsFilm Transparency Range Typically UsedFilm Refractive Index @ 550nmTransparent RangeRemarks
Origin of Value Uncertain
MeltingSublimationE-Gun
Crucible / Liner material
E-Gun
Boat material
PremeltingLow Residual PressureReactive GasSubstrate Temperature RangeIron or Plasma
Assistance
Low
μm
High
μm
Cu CrucibleW CrucibleMo CrucibleTa CrucibleC CrucibleAl2O3BN CrucibleW BoatMo BoatTa Boat<100℃100-200℃200-300℃
Al2O31344-28-13.97 g/cm³4N2054 ℃












~0.19~71.62 200-5000nmM-index material for NUV-VIS-NIR
CeF37758-88-56.20 g/cm³4N1460 ℃









0.3131.62 300-5000nmL-Index Material for IR applicatons
LaF313709-38-16.00 g/cm³4N1500 ℃










0.15121.59 140-14000nmH-Index Material for DUV applications
La2O3+Al2O31312-81-8
1344-28-1
4.70 g/cm³3N51900 ℃




















1.69 170-9000nmM-Index Material which has wider transparent range than Al2O3
SiO10097-28-62.10 g/cm³3N1700 ℃









0.4
(partly oxidized film/Si2o3)

0.7
(Reduced film/SiO)
8

8
1.85±0.03700-9000nmAdhesion Promoter and M-Index Material for VIS-NIR applications
YF313709-49-44.01 g/cm³4N1387 ℃







0.19121.59 220-14000nmM-Index Material for IR applicatons
Y2O31314-36-95.01 g/cm³4N2415 ℃possiblepossible









<0.2510~121.79 250-12000nmM-index material and adhesion promoter for IR applications
YbF313760-80-08.20 g/cm³4N1160 ℃possiblepossible







possible
0.2
Weak intrinsic film absorption band in the 0.9~1.0μm wavelength range
在0.9~1.0μm
121.48 220-14000nmL-Index Material for IR applicatons(High-power laser coatings)

Core competencies

  • Brand advantage

    Brand advantage

  • Strategic advantage

    Strategic advantage

  • R & D and talent stock advantage

    R & D and talent stock advantage

  • Supply chain advantage

    Supply chain advantage

View More

Certificate

  • IATF16949

    IATF16949

  • ISO9001

    ISO9001

  • ISO14001

    ISO14001

  • IATF16949-2016

    IATF16949-2016

  • IATF16949-2016

    IATF16949-2016

  • ISO45001-2018

    ISO45001-2018

  • ISO45001

    ISO45001

  • Indium Tin Oxide for REACH225

    Indium Tin Oxide for REACH225