Alloy Sputtering Target
Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings.
Material Composition: Titanium (Ti) and Aluminum (Al) alloy
Description: Ti+Al alloy sputtering targets are used for the deposition of thin films with specific properties such as corrosion resistance, high temperature resistance, and mechanical strength. These alloys find applications in aerospace, automotive, and biomedical industries.
Material Composition: Aluminum (Al) and Scandium (Sc) alloy
Description: Al+Sc alloy sputtering targets are utilized for the deposition of thin films with enhanced mechanical properties, such as high strength, lightweight, and improved corrosion resistance. These alloys are commonly used in aerospace, sporting goods, and automotive components.
Material Composition: Silver (Ag) alloy
Description: Ag sputtering targets are employed for the deposition of silver thin films in various applications, including optical coatings, electrical contacts, and decorative finishes. Silver films exhibit excellent electrical conductivity and optical reflectivity, making them suitable for electronic and optical devices.
Material Composition: Indium (In) and Tin (Sn) alloy
Description: In+Sn alloy sputtering targets are used for the deposition of indium-tin oxide (ITO) thin films, which are transparent conductive coatings widely used in applications such as touchscreens, flat-panel displays, and solar cells. These coatings exhibit both electrical conductivity and optical transparency.
Material Composition: Nickel (Ni) and Chromium (Cr) alloy
Description: Ni+Cr alloy sputtering targets are utilized for the deposition of thin films with properties such as high temperature resistance, corrosion resistance, and oxidation resistance. These alloys find applications in various industries, including aerospace, automotive, and electronics.
Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
Rotary Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
Product classification
Core competencies
Brand advantage
Strategic advantage
R & D and talent stock advantage
Supply chain advantage