Liquid crystal display array substrate requires high uniformity and flatness of the film, the target requires high purity, high density and fine crystal features.

Full range of sputtering targets (Mo, Al, Cu, Ti, ITO, etc.) and evaporation materials (Ag, Mg, Yb) for TFT-LCD and OLED technology, supporting a variety of G2.5-G11 generation lines.

Sputtering targets are used in wafer fabrication and chip packaging. In wafer fabrication, targets are mainly used to make conductive layers, barrier layers, and metal gates.

In the chip packaging link, the target is used to generate metal layers, wiring layers and other metal materials under the convex points. Although the amount of target material in the field of wafer fabrication and chip packaging is not large, accounting for only 3%, but the quality of the sputtering target directly affects the uniformity and performance of the conductive layer and barrier layer, and then affects the transmission speed and stability of the chip. Therefore, target material is one of the core raw materials of semiconductor production.

Covering Logic IC, power IC, DRAM, LED, discrete device and more.

Provide all kinds of metal / non-metal high purity sputtering target materials (Al, Cu, Ti, Ta ,W, Au, Ag).

It can be divided into two routes: thin film cell and crystalline silicon cell.

ITO target is mainly suitable for HJT technology route in N-type crystalline silicon cell, which plays the role of light transmission and conduction. The perovskite structure route of thin film cells can be achieved by physical vapor deposition (PVD) technology.

 

Thin-film solar technology is becoming a revolutionary and innovative technology, we provide diversified sputtering targets

(ITO, AZO, ZnO, Cu, Mo, Al, Ag, Cr, etc.) for our customers in the photovoltaic industry.

Touch panel technology is widely used in a variety of mobile devices, entertainment facilities and public facilities

We provides a variety of alloys and compound targets for touch panel  industry.

(ITO, Si, Nb, NbOx, MoNb, AlNd, etc.)

Through evaporation coating, the optical properties of the lens are changed, such as refraction properties and light transmission properties, etc.

PVD coatings used in optical applications include anti-reflective coatings in cameras, high-reflective coatings in solar receivers, and low-emissivity coatings on glass.

Specifically, high reflection film, anti-reflection film, infrared film, ultraviolet film, waterproof film, conductive film, polarization film, dielectric film, etc.

In the past 20 years, we have provided more than 100 kinds of PVD coating materials to more than 300 customers in the optical industry worldwide.

(SiO2 SiAl Ti3O5 Ta2O5 Ta Nb ZrO2, etc.)

​The promotion of technology will bring revolutionary changes to human life, which is also the basis of the new "Internet of Things era".

(Si, SiO2, MgF2, Ta2O5, Ti3O5, SiAl, Ta )

Mainly used in the surface coating, anti-corrosion coating, Logo production, auto parts coating, etc.(Zr, Ti, Cr, etc.)

Decorative coating mainly refers to the surface coating of items such as mobile phones, watches, eyeglasses, bathroom fixtures, and hardware components to enhance their appearance. 

Pure metal sputtering targets or alloy sputtering targets offer various metallic colors, making PVD coating widely used for decorative purposes. For instance, TiN sputter film presents a luxurious gold color, while Cr2N sputter film exhibits a beautiful silver color. PVD coatings can also provide other special colors such as rose gold, gunmetal, and antique bronze.

​Low-E glass is widely used in high-end buildings, automotive glass and automated factories, to reduce radiation and energy conservation.

Take Low-E glass as an example, it reflects heat back to its source, keeping rooms cool in summer and warm in winter, helps prevent UV fading, and requires no special cleaning. Therefore, Low-E coated glass has replaced traditional architectural glass recently. Almost all major glass processing companies are rapidly increasing their glass coating lines, consequently driving the demand for sputtering targets.

(Ag, SiAl, NiCr, etc.)