ITO, SiO2, IGZO, AZO Nb2Ox, TiOx Sputtering Target - Manufacturers and Suppliers

ACETRON is a comprehensive company integrated with R& D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD display & touch panel and surface decoration.

ITO (Indium Tin Oxide) Sputtering Target:

Material Composition: Indium Tin Oxide (ITO)

Description: ITO sputtering targets are commonly used in the production of transparent conductive coatings for applications such as touchscreens, LCDs, solar cells, and architectural glass.

Properties: Transparent, conductive, and durable.

Application: Thin film deposition for electronic and optoelectronic devices.

SiO2 (Silicon Dioxide) Sputtering Target:

Material Composition: Silicon Dioxide (SiO2)

Description: SiO2 sputtering targets are used for the deposition of silicon dioxide thin films in various applications, including semiconductor manufacturing, optical coatings, and protective layers.

Properties: Insulating, transparent, and chemically stable.

Application: Optical coatings, dielectric layers, barrier films, and protective coatings.

IGZO (Indium Gallium Zinc Oxide) Sputtering Target:

Material Composition: Indium Gallium Zinc Oxide (IGZO)

Description: IGZO sputtering targets are utilized in the fabrication of thin-film transistors (TFTs) for high-performance displays, such as LCD and OLED screens, due to their superior electrical properties and transparency.

Properties: High electron mobility, transparency, and stability.

Application: Thin-film transistor fabrication for displays, touch panels, and flexible electronics.

AZO (Aluminum Zinc Oxide) Sputtering Target:

Material Composition: Aluminum Zinc Oxide (AZO)

Description: AZO sputtering targets are employed in the production of transparent conductive oxide (TCO) films with applications in solar cells, flat-panel displays, and smart windows.

Properties: Transparent, conductive, and corrosion-resistant.

Application: Transparent conductive coatings, antistatic layers, and photovoltaic devices.

Nb2Ox (Niobium Oxide) Sputtering Target:

Material Composition: Niobium Oxide (Nb2Ox)

Description: Nb2Ox sputtering targets are utilized for the deposition of niobium oxide thin films, which find applications in optical coatings, electrochromic devices, and gas sensors.

Properties: Dielectric, electrochromic, and photochromic.

Application: Optical coatings, electrochromic windows, gas sensing, and photovoltaic devices.

TiOx (Titanium Oxide) Sputtering Target:

Material Composition: Titanium Oxide (TiOx)

Description: TiOx sputtering targets are used for the deposition of titanium oxide thin films, which have applications in photocatalysis, solar cells, sensors, and optical coatings.

Properties: Photocatalytic, semiconducting, and biocompatible.

Application: Photocatalytic coatings, solar energy conversion, gas sensors, and biomedical devices.