ITO, SiO2, IGZO, AZO Nb2Ox, TiOx Sputtering Target - Manufacturers and Suppliers

Acetron, founded in 2002, specializes in leading-edge PVD coating materials, providing highly pure materials for the most demanding coating processes. With over 20 years of experience, we focus on optimizing PVD technology, which is recognized as a sustainable solution that significantly reduces CO2 emissions. Our products, including sputtering targets and evaporation materials, serve diverse industries such as optics, automotive, energy, and medical applications, supporting OEM/ODM needs with accurate tolerances and stable quality. Our commitment to excellence is backed by certifications from our in-house laboratory and international authorities, including ISO9001, IATF16949, ISO14001, and ISO45001. We utilize advanced equipment like SEM, GDMS, and vacuum technology, and we have developed a large automatic bonding production line for sputtering targets, reinforcing our position as a leader in the coating materials industry.

Acetron are specialists in the manufacture of ceramic sputtering targets for the Semiconductor Industry manufactured from 94%-99.99% alumina and Chemical Vapor Deposition (CVD) Silicon Carbide (SiC) for Physical Vapour Deposition (PVD) applications. Our alumina sputtering targets are suited to a variety of applications including wear coatings, dielectric coatings and barrier coatings, whereas our CVD SiC sputtering targets are an excellent choice for the deposition of high-purity SiC thin films for demanding applications such as the manufacture of magnetic disk drive heads. Get in touch with us today to discuss your needs!

Features of Ceramic Sputtering Targets:

Controlled microstructures

Very high purity, consistency, and uniformity

Thermal conductivity that is twice that of sintered SiC

Highly resistant to thermal shock

Benefits of Ceramic Sputtering Targets :

Sizes to one meter

High tolerance ceramic machining/polishing

Near net shape processing

Ceramic sputtering targets, such as the SiO2 sputtering target and the titanium dioxide sputtering target, are widely used in thin film applications for their excellent insulating properties. Specific materials like the silicon dioxide sputtering target and the IGZO sputtering target are essential for creating high-quality transparent conductive layers. The AZO sputtering target is another key material in this category, known for its use in developing advanced optoelectronic devices.

ITO (Indium Tin Oxide) Sputtering Target:

Material Composition: Indium Tin Oxide (ITO)

Description: ITO sputtering targets are commonly used in the production of transparent conductive coatings for applications such as touchscreens, LCDs, solar cells, and architectural glass.

Properties: Transparent, conductive, and durable.

Application: Thin film deposition for electronic and optoelectronic devices.

SiO2 (Silicon Dioxide) Sputtering Target:

Material Composition: Silicon Dioxide (SiO2)

Description: SiO2 sputtering targets are used for the deposition of silicon dioxide thin films in various applications, including semiconductor manufacturing, optical coatings, and protective layers.

Properties: Insulating, transparent, and chemically stable.

Application: Optical coatings, dielectric layers, barrier films, and protective coatings.

IGZO (Indium Gallium Zinc Oxide) Sputtering Target:

Material Composition: Indium Gallium Zinc Oxide (IGZO)

Description: IGZO sputtering targets are utilized in the fabrication of thin-film transistors (TFTs) for high-performance displays, such as LCD and OLED screens, due to their superior electrical properties and transparency.

Properties: High electron mobility, transparency, and stability.

Application: Thin-film transistor fabrication for displays, touch panels, and flexible electronics.

AZO (Aluminum Zinc Oxide) Sputtering Target:

Material Composition: Aluminum Zinc Oxide (AZO)

Description: AZO sputtering targets are employed in the production of transparent conductive oxide (TCO) films with applications in solar cells, flat-panel displays, and smart windows.

Properties: Transparent, conductive, and corrosion-resistant.

Application: Transparent conductive coatings, antistatic layers, and photovoltaic devices.

Nb2Ox (Niobium Oxide) Sputtering Target:

Material Composition: Niobium Oxide (Nb2Ox)

Description: Nb2Ox sputtering targets are utilized for the deposition of niobium oxide thin films, which find applications in optical coatings, electrochromic devices, and gas sensors.

Properties: Dielectric, electrochromic, and photochromic.

Application: Optical coatings, electrochromic windows, gas sensing, and photovoltaic devices.

TiOx (Titanium Oxide) Sputtering Target:

Material Composition: Titanium Oxide (TiOx)

Description: TiOx sputtering targets are used for the deposition of titanium oxide thin films, which have applications in photocatalysis, solar cells, sensors, and optical coatings.

Properties: Photocatalytic, semiconducting, and biocompatible.

Application: Photocatalytic coatings, solar energy conversion, gas sensors, and biomedical devices.