Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.
Rotary sputtering targets, often referred to as rotary targets or rotatable sputtering targets, are increasingly used in magnetron sputtering systems for enhanced efficiency and uniformity. A rotary sputter target, due to its cylindrical design, allows for better material utilization compared to traditional planar targets. Rotatable targets are particularly beneficial in large-scale production, where consistent coating quality is essential.
Architectural Glass Coating (Low-E, Solar Control Glass)
Photovoltaic Industry (Thin Film Solar Cells)
Flat Panel Displays & Touch Screens
Optical Lens & Mirror Coatings
Semiconductor Devices
Decorative and Hard Coatings
We also support material selection consulting and long-term supply partnerships.
We provide both pure metal and alloy rotary sputtering targets. Materials include but are not limited to:
| Material | Purity | Application |
| Titanium (Ti) | ≥ 99.5% | Architectural Glass, Optical Coating |
| Molybdenum (Mo) | ≥ 99.9% | Solar Glass, Semiconductor |
| Chromium (Cr) | ≥ 99.5% | Decorative Coatings |
| Aluminum (Al) | ≥ 99.999% | Touch Panel, Display |
| Zinc (Zn), Tin (Sn), Copper (Cu), Tungsten (W), Indium (In), NiCr, ZnAl, etc. | Customized | Based on project needs |
Custom alloy compositions are available upon request.
Every rotary target undergoes strict inspection, including:
Chemical Composition Analysis (ICP, GDMS)
X-ray Diffraction (XRD)
Density Test
Grain Size & Microstructure Analysis
Surface Roughness & Straightness Check
We provide Material Certificates, Test Reports, and third-party verification upon request.
Certified under ISO 9001, RoHS, and REACH.
15+ years of experience in sputtering target manufacturing
Full in-house production from raw material to finished product
Competitive pricing with stable quality
Global clients in 30+ countries
Responsive technical and after-sales support
Manufacturing processes
Manufacturing processes depend on the properties of the target material and its application.
We have (Vacuum melting, Rolling, Vacuum spraying, Atmospheric spraying, Vacuum hot pressing, Hot Isostatic Pressing (HIP), Cold Isostatic Pressing +Various atmosphere sintering technology, Low temperature metal, Vacuum hot pressing sintering technology, Electron beam melting, Zone melting purification, Vacuum directional solidification technology, etc).
For metal and alloy target, we adopt Vacuum melting, Rolling, Low temperature metal,Vacuum hot pressing sintering, Electron beam melting, Zone melting purification, Vacuum directional solidification technology.
Both Planar and Rotary target available
Planar targets mainly refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods to meet different needs.
Rotary target is a magnetically controlled target. The target is shaped like a cylinder containing a stationary magnet for rotation. Its advantage is high utilization rate, the disadvantage is high cost.
Thickness: 30mm (can be 60mm for round target)
Width: max 2000mm
Length: max 4000mm
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm
Bonding
Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm
Thickness: 30mm (can be 60mm for round target)
Width: max 2000mm
Length: max 4000mm
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm
Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm
Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm
Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm
Bonding
Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm
Planar/Rotary target can be customized as per your request.
| Chemical Formula | Purity | Forms | Specification |
| Al | 99.99% / 99.999% / 99.9995% | Planar / Rotary | Customized |
| Ag | 99.99% / 99.995% / 99.999% | Planar / Rotary | Customized |
| Au | 99.99% / 99.999% | Planar | Customized |
| Cu | 99.97% / 99.99% / 99.999% | Planar / Rotary | Customized |
| Cr | 99.5% / 99.95% | Planar / Rotary | Customized |
| C | 99.99% | Planar / Rotary | Customized |
| Co | 99.9% | Planar | Customized |
| Fe | 99.99% | Planar | Customized |
| Ge | 99.999% | Planar | Customized |
| Hf | 99.9% | Planar | Customized |
| In | 99.99% | Planar / Rotary | Customized |
| Mg | 99.99% | Planar | Customized |
| Mo | 99.95% | Planar / Rotary | Customized |
| Nb | 99.95% | Planar / Rotary | Customized |
| Ni | 99.9% / 99.99% | Planar | Customized |
| Si | 99.99% / 99.999% | Planar / Rotary | Customized |
| Sc | 99.99% | Planar | Customized |
| Sn | 99.99% | Planar / Rotary | Customized |
| Ta | 99.99% | Planar / Rotary | Customized |
| Ti | 99.6% / 99.99% / 99.995% | Planar / Rotary | Customized |
| W | 99.95% | Planar | Customized |
| Zr | 99.60% | Planar / Rotary | Customized |
Acetron, founded in 2002, specializes in leading-edge PVD coating materials, providing highly pure materials for the most demanding coating processes. With over 20 years of experience, we focus on optimizing PVD technology, which is recognized as a sustainable solution that significantly reduces CO2 emissions. Our products, including sputtering targets and evaporation materials, serve diverse industries such as optics, automotive, energy, and medical applications, supporting OEM/ODM needs with accurate tolerances and stable quality. Our commitment to excellence is backed by certifications from our in-house laboratory and international authorities, including ISO9001, IATF16949, ISO14001, and ISO45001. We utilize advanced equipment like SEM, GDMS, and vacuum technology, and we have developed a large automatic bonding production line for sputtering targets, reinforcing our position as a leader in the coating materials industry.
Product classification
Core competencies
Brand advantage
Strategic advantage
R & D and talent stock advantage
Supply chain advantage
Certificate
IATF16949
ISO9001
ISO14001
IATF16949-2016
IATF16949-2016
ISO45001-2018
ISO45001
Indium Tin Oxide for REACH225
