Sputtering Target, Sputter Coater Targets, PVD Coating Materials

Sputtering Target

Sputtering Target Manufacturer & Supplier – High Purity & Customization

Acetron is a trusted manufacturer and global supplier of high-purity sputtering targets used in a wide range of physical vapor deposition (PVD) processes. We provide metal, alloy, and ceramic sputtering targets designed for consistent thin film performance across semiconductor, optical, photovoltaic, and decorative coating applications.

Our sputtering targets are produced with ultra-high purity materials (up to 99.999%), dense microstructures, and advanced bonding techniques to ensure optimal film quality, uniformity, and target utilization. Whether you need standard compositions or fully customized specifications, Acetron delivers precision-engineered targets tailored to your process requirements.

Types of Sputtering Targets We Offer

Metal Sputtering Target: Single-element targets such as copper (Cu), aluminum (Al), titanium (Ti), molybdenum (Mo), etc.

Alloy Sputtering Target: Engineered compositions including TiAl, NiCr, AgCu, and more.

Ceramic Sputtering Target: Oxide, nitride, carbide, and fluoride targets such as ITO, ZnO, Al₂O₃, and TiN.

Key Features

High Purity (up to 5N or 6N)

Low Oxygen and Carbon Impurities

Uniform Grain Structure and Density

Strong Bonding for Stable Operation

Custom Sizes, Shapes, and Compositions Available

Applications of Sputtering Targets

Our sputtering targets are widely used in:

Semiconductor and microelectronics (ICs, MEMS, sensors)

Optical coatings (AR/IR coatings, beam splitters, filters)

Solar energy and photovoltaic modules (CIGS, CdTe, ITO films)

Data storage (hard disks, magnetic layers)

Decorative and wear-resistant coatings (tooling, watches, hardware)

Custom Sputtering Target Services

At Acetron, we understand that every coating process is different. That’s why we offer:

Custom compositions and material formulations

Target size and shape customization (rotatable, planar, circular, rectangular)

Bonding to backing plates (Cu, Mo, Al, etc.)

Small batch production for R&D or pilot runs

Bulk production for OEM and industrial-scale applications

The uniformity and sputtering velocity of the sputtering films are determined by the size, orientation and orientation of the grains. Therefore, the control of grain size and grain direction are the core technologies in the production process of sputtering target material. We have the metal material plastic deformation processing production line and internal tissue structure testing equipment, through scientific process arrangement, can implement precise control of grain crystal direction. Get in touch with us today to discuss your needs!

What is the Lifetime of a Sputtering Target?

Rotary Metal Sputtering Targets

A rotary sputter target is a magnetically controlled component shaped like a cylinder with an embedded stationary magnet for rotation. Its key advantage lies in its high utilization rate, albeit at a higher cost.

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Rotary Alloy Sputtering Target

Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.

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Planar Ceramic Sputtering Target

Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties.

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Sputtering coating refers to the technology that the ions produced by the ion source are accelerated to gather in the vacuum to form a high speed ion beam, which bombards the solid surface, and the kinetic energy exchange between the ions and the solid surface atoms makes the atoms on the solid surface leave the solid and deposit on the surface of the substrate material. The bombarded solid is the raw material for deposition of thin film materials by sputtering method, which is called the sputtering target.

Sputter coater targets play a crucial role in thin film deposition, where the choice of sputtering target material is vital for achieving desired results. A sputtering target, such as an iron sputtering target, is essential in processes like PVD, where metal sputtering targets are commonly used. Understanding how to make sputtering targets involves precise techniques to ensure quality and consistency. VCT sputtering targets, in particular, are designed for specific applications, further highlighting the importance of selecting the right sputtering target material.

Sputtering targets have important applications in many industries. Purity is one of the key performance indicators for producing a suitable coating, the purity of the sputter coater target greatly affects the performance of the film. Through independent R&D and cooperative development, Acetron have the technical ability to produce ultra-high purity sputtering target metal materials. Previously, Acetron target with a purity reached 99.9999 %, was able to meet the process requirements of the electronics industry.

Acetron, founded in 2002, specializes in leading-edge PVD coating materials, providing highly pure materials for the most demanding coating processes. With over 20 years of experience, we focus on optimizing PVD technology, which is recognized as a sustainable solution that significantly reduces CO2 emissions. Our products, including sputtering targets and evaporation materials, serve diverse industries such as optics, automotive, energy, and medical applications, supporting OEM/ODM needs with accurate tolerances and stable quality. Our commitment to excellence is backed by certifications from our in-house laboratory and international authorities, including ISO9001, IATF16949, ISO14001, and ISO45001. We utilize advanced equipment like SEM, GDMS, and vacuum technology, and we have developed a large automatic bonding production line for sputtering targets, reinforcing our position as a leader in the coating materials industry.

Product classification

Core competencies

Brand advantage
Strategic advantage
R & D and talent stock advantage
Supply chain advantage

Certificate

IATF16949
ISO9001
ISO14001
IATF16949-2016
IATF16949-2016
ISO45001-2018
ISO45001
Indium Tin Oxide for REACH225