Alloy Sputtering Target Supplier – High Purity & Customizable

Acetron provides a wide range of alloy sputtering targets engineered for high-performance thin film deposition. Our alloy targets are manufactured using ultra-high purity metals, advanced processing technologies, and strict quality control to ensure consistent film quality and excellent sputtering performance. Whether you require standard compositions or customized alloy sputtering target solutions, we deliver materials that meet the needs of semiconductor, optical, and coating industries.

Why Choose Acetron Alloy Sputtering Targets?

High Purity Materials: Our alloy sputtering targets are produced from ultra-pure raw materials to achieve high-quality thin films with low contamination.

Uniform Microstructure: Optimized grain size and density for enhanced sputtering performance and extended target life.

Stable Composition: Precise alloy formulation guarantees uniform thin film deposition across the entire substrate.

Custom Solutions: We offer customized sizes, shapes, and compositions to meet specific process requirements.

Applications of Alloy Sputtering Targets

Semiconductor device manufacturing

Optical coatings and anti-reflective films

Photovoltaic and display technologies (e.g. ITO films)

Hard coatings for tools and automotive components

Q: Can I customize the composition or shape?

A: Yes, we offer full customization of alloy sputtering targets, including composition ratio, target size, bonding service, and backing plate options.

Ti+Al (Titanium Aluminum) Alloy Sputtering Target:

Material Composition: Titanium (Ti) and Aluminum (Al) alloy

Description: Ti+Al alloy sputtering targets are used for the deposition of thin films with specific properties such as corrosion resistance, high temperature resistance, and mechanical strength. These alloys find applications in aerospace, automotive, and biomedical industries.

Al+Sc (Aluminum Scandium) Alloy Sputtering Target:

Material Composition: Aluminum (Al) and Scandium (Sc) alloy

Description: Al+Sc alloy sputtering targets are utilized for the deposition of thin films with enhanced mechanical properties, such as high strength, lightweight, and improved corrosion resistance. These alloys are commonly used in aerospace, sporting goods, and automotive components.

Ag (Silver) Alloy Sputtering Target:

Material Composition: Silver (Ag) alloy

Description: Ag sputtering targets are employed for the deposition of silver thin films in various applications, including optical coatings, electrical contacts, and decorative finishes. Silver films exhibit excellent electrical conductivity and optical reflectivity, making them suitable for electronic and optical devices.

Indium+Tin (In+Sn) Alloy Sputtering Target:

Material Composition: Indium (In) and Tin (Sn) alloy

Description: In+Sn alloy sputtering targets are used for the deposition of indium-tin oxide (ITO) thin films, which are transparent conductive coatings widely used in applications such as touchscreens, flat-panel displays, and solar cells. These coatings exhibit both electrical conductivity and optical transparency.

Ni+Cr (Nickel Chromium) Alloy Sputtering Target:

Material Composition: Nickel (Ni) and Chromium (Cr) alloy

Description: Ni+Cr alloy sputtering targets are utilized for the deposition of thin films with properties such as high temperature resistance, corrosion resistance, and oxidation resistance. These alloys find applications in various industries, including aerospace, automotive, and electronics.

For your custom R&D, production materials need or if you do not find the sputtering target as per your need from the list. Contact us.